Article
Article name Low Dielectric Constant Materials in Micro- and Nanoelectronics
Authors Arkhincheev V.Y. Doctor of Physics and Mathematics, Chief researcher of the Department of Physical Problems, varkhin@mail.ru
Baklanov M.R. Doctor of Chemistry, Chairman of IC Program Reliability, baklanov@imec.be
Bibliographic description
Section Scientific Research
UDK УДК 621.3.049.77
DOI
Article type
Annotation The discovery of transistor is one of the most outstanding events in technical revolution in the 20th century. An integrated circuit (IC, chip, microchip) is a miniaturized electronic circuit consisting mainly of semiconductor devices, as well as passive components. Integrated circuits are fabricated on the surface of a semiconductor material and are used in almost all electronic equipment in use today. Computers, cellular phones, and other digital appliances are now inextricable parts of the structure of modern societies, made possible by the production of integrated circuits. Increase of complexity of integrated circuits required introduction of new materials. These are not only new types of semiconducting materials but also different types of conductive and isolating materials. Copper recently replaced traditional Al, presently carbon nanotubes and grapheme are considered as potential candidates. Different types of dielectric materials are used for the gate application (high-k materials) and for interconnects in integrated circuits (low-k). This paper givesa short historical overview and more detailed discussions of properties of low-k materials developed and studied during the last decade.
Key words microelectronics, interconnect technology, low-k materials, porosity.
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Full articleLow Dielectric Constant Materials in Micro- and Nanoelectronics